US 12,149,870 B2
Amplitude and biphase control of MEMS scanning device
Michael Edward Samples, Redmond, WA (US); Mikhail Smirnov, Bellevue, WA (US); Jozef Barnabas Houben, Seattle, WA (US); Damon Marlow Domjan, Seattle, WA (US); and Joshua Owen Miller, Woodinville, WA (US)
Assigned to Microsoft Technology Licensing, LLC, Redmond, WA (US)
Filed by Microsoft Technology Licensing, LLC, Redmond, WA (US)
Filed on Jul. 6, 2023, as Appl. No. 18/218,940.
Application 18/218,940 is a continuation of application No. 17/832,180, filed on Jun. 3, 2022, granted, now 11,743,434.
Application 17/832,180 is a continuation of application No. 16/901,481, filed on Jun. 15, 2020, granted, now 11,368,658, issued on Jun. 21, 2022.
Prior Publication US 2023/0353713 A1, Nov. 2, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H04N 9/31 (2006.01); G01K 13/08 (2006.01); G02B 26/08 (2006.01); G02B 26/10 (2006.01); G06F 18/25 (2023.01)
CPC H04N 9/3135 (2013.01) [G01K 13/08 (2013.01); G02B 26/0858 (2013.01); G02B 26/101 (2013.01); G06F 18/253 (2023.01); H04N 9/3194 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for building a model that reflects a relationship between a temperature characteristic of a micro-electromechanical system (MEMS) scanning device and an operational characteristic of the MEMS scanning device, said method comprising:
causing one or more laser units and the MEMS scanning device to project a predetermined pattern, wherein the predetermined pattern has multiple lines in a scanning direction of the MEMS scanning device;
while the predetermined pattern is being projected, monitoring a temperature of the MEMS scanning device, such that temperature data is generated;
while the predetermined pattern is being projected, obtaining images of the predetermined pattern, such that image data is generated, wherein the image data provides indications of how the predetermined pattern changes over time based on fluctuations in the temperature of the MEMS scanning device, and wherein the indications are reflective of the operational characteristic of the MEMS scanning device; and
feeding the temperature data and the image data into a model that determines a relationship between the temperature of the MEMS scanning device and the operational characteristic of the MEMS scanning device.