US 12,148,967 B2
Filter and method for manufacturing the same
Tsuyoshi Sukegawa, Tokyo (JP); and Takahiro Miyamoto, Kanagawa (JP)
Assigned to NEC CORPORATION, Tokyo (JP)
Filed by NEC Corporation, Tokyo (JP)
Filed on May 23, 2022, as Appl. No. 17/750,552.
Claims priority of application No. 2021-094160 (JP), filed on Jun. 4, 2021.
Prior Publication US 2022/0393324 A1, Dec. 8, 2022
Int. Cl. H01P 1/20 (2006.01); H01P 11/00 (2006.01)
CPC H01P 1/20 (2013.01) [H01P 11/003 (2013.01)] 3 Claims
OG exemplary drawing
 
1. A filter comprising:
a substrate having a dielectric property;
an initial stage coupling part formed on the substrate; and
an interstage coupling part formed on the substrate, wherein
the initial stage coupling part is formed so that a reflection delay is decreased in accordance with an increase in a passband due to a manufacturing error of the substrate or the interstage coupling part, or so that the reflection delay is increased in accordance with a decrease in the passband, and
the initial stage coupling part is a gap part formed of an input/output conductor formed on one surface of the substrate and a conductor formed on another surface of the substrate facing the one surface of the substrate so that the conductor is opposed to the input/output conductor.