| CPC H01L 27/14627 (2013.01) [G02B 3/0018 (2013.01); G03F 7/0005 (2013.01); H01L 27/14621 (2013.01); H01L 27/14685 (2013.01)] | 20 Claims |

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1. A method of forming a device, the method comprising:
depositing a first photoresist layer over a substrate;
forming an array of seed lenses by patterning and reflowing the first photoresist layer, a dimension of the array of seed lenses varying across the substrate;
forming a second photoresist layer over the array of seed lenses; and
forming a microlens array by patterning and reflowing the second photoresist layer, a sagittal height of a seed lens in the array of seed lenses progressively decreasing from a center of the microlens array to an edge of the microlens array.
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