US 12,148,763 B2
Display device including two kinds of semiconductor layers
Dong-Hwi Kim, Osan-si (KR); and Jin Jeon, Seoul (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Display Co., LTD., Yongin-si (KR)
Filed on Apr. 19, 2023, as Appl. No. 18/136,756.
Application 18/136,756 is a continuation of application No. 17/555,370, filed on Dec. 17, 2021, granted, now 11,670,644.
Application 17/555,370 is a continuation of application No. 16/996,504, filed on Aug. 18, 2020, granted, now 11,244,967.
Claims priority of application No. 10-2020-0024388 (KR), filed on Feb. 27, 2020.
Prior Publication US 2023/0253414 A1, Aug. 10, 2023
Int. Cl. G09G 3/32 (2016.01); H01L 27/12 (2006.01); H01L 27/15 (2006.01); H10K 59/121 (2023.01); H10K 59/131 (2023.01); H10K 59/35 (2023.01)
CPC H01L 27/124 (2013.01) [G09G 3/32 (2013.01); G09G 2300/0426 (2013.01); G09G 2300/0809 (2013.01); G09G 2310/0243 (2013.01); G09G 2310/0267 (2013.01); H01L 27/156 (2013.01); H10K 59/1213 (2023.02); H10K 59/1216 (2023.02); H10K 59/131 (2023.02); H10K 59/35 (2023.02)] 41 Claims
OG exemplary drawing
 
1. A display device, comprising:
a substrate;
a polycrystalline semiconductor layer on the substrate, the polycrystalline semiconductor layer including a channel, a first electrode, and a second electrode of a first transistor and a channel, a first electrode, and a second electrode of a second transistor;
a first gate conductor layer including a gate electrode of the first transistor overlapping the channel of the first transistor, and a gate electrode of the second transistor overlapping the channel of the second transistor;
an oxide semiconductor layer on the substrate, the oxide semiconductor layer including a channel, a first electrode, and a second electrode of a third transistor;
a second gate conductor layer including a lower gate electrode of the third transistor overlapping the channel of the third transistor;
a third gate conductor layer including an upper gate electrode of the third transistor overlapping the channel of the third transistor; and
a first data conductor layer including a first initialization voltage supply line electrically connected to the second transistor, and a first connection electrode electrically connected to the second electrode of the third transistor and the gate electrode of the first transistor,
wherein the first initialization voltage supply line is disposed on the same layer as the first connection electrode.