US 12,148,647 B2
Integrated substrate measurement system
Patricia Schulze, Giddings, TX (US); Gregory John Freeman, Austin, TX (US); Michael Kutney, Santa Clara, CA (US); Arunkumar Ramachandraiah, Bengaluru (IN); Chih Chung Chou, San Jose, CA (US); Zhaozhao Zhu, Milpitas, CA (US); and Ozkan Celik, Cedar Park, TX (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jan. 25, 2022, as Appl. No. 17/584,322.
Prior Publication US 2023/0238266 A1, Jul. 27, 2023
Int. Cl. H01L 21/68 (2006.01); G01B 11/24 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/681 (2013.01) [G01B 11/24 (2013.01); H01L 21/6831 (2013.01); H01L 21/68721 (2013.01); G01B 2210/56 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An apparatus comprising
a substrate holder to secure a substrate;
a first actuator to rotate the substrate holder about a first axis;
a second actuator to move the substrate holder linearly along a second axis;
a first sensor to generate one or more first measurements or images of a first plurality of target positions on the substrate;
a second sensor to generate one or more second measurements of a second plurality of target positions on the substrate; and
a processing device to:
determine, based on the one or more first measurements or images of the first plurality of target positions, an estimate of a position of the substrate on the substrate holder;
cause the first actuator to rotate the substrate holder about the first axis for measurement of a target position of the second plurality of target positions, wherein the rotation causes an offset between a field of view of the second sensor and the target position on the substrate due to the substrate not being centered on the substrate holder;
cause the second actuator to move the substrate holder linearly along the second axis to correct the offset; and
determine a profile across a surface of the substrate based on the one or more second measurements of the second plurality of target positions generated by the second sensor.