US 12,148,634 B2
Device for etching the periphery edge of a substrate comprising substrate sensing unit
Taek Youb Lee, Chungcheongnam-do (KR)
Assigned to DEVICEENG CO., LTD., Chungcheongnam-do (KR)
Filed by DEVICEENG CO., LTD., Chungcheongnam-do (KR)
Filed on Apr. 26, 2022, as Appl. No. 17/729,067.
Claims priority of application No. 10-2022-0022465 (KR), filed on Feb. 21, 2022.
Prior Publication US 2023/0268201 A1, Aug. 24, 2023
Int. Cl. H01L 21/67 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/67069 (2013.01) [H01L 21/68742 (2013.01); H01L 21/68785 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A substrate edge etching apparatus comprising:
a substrate support assembly having a horizontally rotatable chuck base with a light through hole vertically penetrating a center thereof and chuck pins disposed on top of the chuck base to support a substrate;
a spin motor having a hollow tube-shaped driving shaft adapted to rotate the substrate support assembly;
a purge gas supply assembly connected to the driving shaft through a bearing in a state of not rotating, extending vertically from the underside center of the chuck base in a state of being spaced apart from an underside of the chuck base, and having a hollow hole penetratingly extending therealong in an upward and downward direction thereof to supply a purge gas to the light through hole; and
a substrate sensing unit having a light transmission part, which includes a light transmitter disposed inside the hollow hole of the purge gas supply assembly, and a light reception part disposed apart above the light through hole of the chuck base,
wherein light that is transmitted from the light transmission part and passes through the hollow hole and the light through hole is sensed by means of the light reception part.