| CPC H01L 21/67051 (2013.01) [H01L 21/6704 (2013.01); B05B 1/10 (2013.01); B08B 3/048 (2013.01); B08B 3/08 (2013.01)] | 17 Claims |

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1. A substrate processing apparatus, comprising:
a holder configured to hold a substrate;
a driving unit configured to rotate the holder;
an inner cup body provided in the holder to surround the substrate held by the holder from an outside thereof;
a mist guard, surrounding the holder and the inner cup body from an outside thereof such that the holder and the inner cup body are located inside the mist guard, configured to be moved up and down;
a processing liquid supply configured to supply a processing liquid to the substrate held by the holder;
a cleaning liquid supply configured to supply a cleaning liquid; and
a controller
configured to perform:
supplying the processing liquid to the substrate from the processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and
dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised,
wherein the inner cup body includes an annular groove configured to store therein the cleaning liquid supplied from the cleaning liquid supply, and formed in a top surface of the inner cup body to extend along an entire circumference of the inner cup body, and
the dispersing of the cleaning liquid comprises supplying the cleaning liquid from the cleaning liquid supply to the annular groove, and rotating the inner cup body along with the holder by the driving unit to disperse the cleaning liquid stored in the annular groove to the entire inner peripheral surface of the mist guard.
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