US 12,147,164 B2
Motion control apparatus, lithography apparatus, planarization apparatus, processing apparatus, and article manufacturing method
Ryo Nawata, Tochigi (JP); Yuichiro Miki, Kanagawa (JP); and Shota Takami, Chiba (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Dec. 6, 2022, as Appl. No. 18/062,117.
Claims priority of application No. 2021-204437 (JP), filed on Dec. 16, 2021.
Prior Publication US 2023/0194999 A1, Jun. 22, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70775 (2013.01) 24 Claims
OG exemplary drawing
 
1. A motion control apparatus comprising:
a first movable part;
a second movable part;
a first measurement device configured to measure a motion of the first movable part;
a first compensator configured to generate a first manipulated variable based on an output from the first measurement device and a target value for controlling the motion of the first movable part;
a generator configured to generate an observed value concerning a relative motion between the first movable part and the second movable part;
a second compensator configured to generate a second manipulated variable based on the observed value concerning the relative motion between the first movable part and the second movable part; and
a calculator configured to generate a manipulated variable for driving the first movable part based on the first manipulated variable generated by the first compensator and the second manipulated variable generated by the second compensator,
wherein for the second compensator, a parameter value for generating the second manipulated variable is decided by machine learning.