US 12,147,008 B2
Thin film optical lens and method for coating a lens
Norman L. Kester, Rogue River, OR (US); Nicholas M. Hall, Talent, OR (US); and Richard D. Unbankes, Medford, OR (US)
Assigned to Quantum Innovations, Inc., Central Point, OR (US)
Filed by Quantum Innovations, Inc., Central Point, OR (US)
Filed on Apr. 23, 2020, as Appl. No. 16/856,394.
Claims priority of provisional application 62/838,751, filed on Apr. 25, 2019.
Prior Publication US 2020/0341168 A1, Oct. 29, 2020
Int. Cl. G02B 1/10 (2015.01); C03C 17/34 (2006.01); G02B 5/20 (2006.01); G02B 1/115 (2015.01); G02B 5/28 (2006.01)
CPC G02B 1/10 (2013.01) [C03C 17/3417 (2013.01); G02B 5/208 (2013.01); C03C 2217/213 (2013.01); C03C 2217/22 (2013.01); C03C 2217/734 (2013.01); C03C 2218/151 (2013.01); C03C 2218/156 (2013.01); G02B 1/115 (2013.01); G02B 5/283 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method of coating a thin film optical lens, the method comprising:
providing an optical substrate, the optical substrate comprising a first surface and an opposing second surface, the first surface being operable to at least partially reflect infrared radiation, the second surface being operable to at least partially transmit ultraviolet light in the wavelength range between 300 to 400 nanometers;
cleaning the surfaces of the optical substrate;
applying a low index dielectric material and a high index dielectric material on at least the first surface of the optical substrate, the low index dielectric material and the high index dielectric material being applied in the following order:
applying about 145.00 nanometers of the low index dielectric material on at least the first surface of the optical substrate;
applying about 15.00 nanometers of the high index dielectric material on at least the first surface of the optical substrate;
applying about 17.00 nanometers of the low index dielectric material on at least the first surface of the optical substrate;
applying about 104.50 nanometers of the high index dielectric material on at least the first surface of the optical substrate;
applying about 153.00 nanometers of the low index dielectric material on at least the first surface of the optical substrate;
applying about 103.00 nanometers of the high index dielectric material on at least the first surface of the optical substrate; and
applying about 75.00 nanometers of the low index dielectric material on at least the first surface of the optical substrate,
whereby the optical substrate reduces transmission of infrared radiation, blocks high-energy visible light transmission, and reduces backside reflection of ultraviolet light from the lens to enhance viewing characteristics of the optical substrate,
whereby the applied dielectric materials enable the first surface to reflect up to 40 percent of the infrared radiation,
whereby the applied dielectric materials enable the second surface to transmit about 99 percent of the ultraviolet light in the wavelength range between 300 to 400 nanometers.