US 12,146,216 B2
Substrate treatment apparatus having exhaust structure
Taek Youb Lee, Chungcheongnam-do (KR); Jun Hwan Lee, Chungcheongnam-do (KR); and Man Je Bang, Chungcheongnam-do (KR)
Assigned to DEVICEENG CO., LTD., Chungcheongnam-do (KR)
Filed by DEVICEENG CO. LTD, Chungcheongnam-do (KR)
Filed on Dec. 27, 2021, as Appl. No. 17/562,746.
Claims priority of application No. 10-2021-0120968 (KR), filed on Sep. 10, 2021.
Prior Publication US 2023/0080325 A1, Mar. 16, 2023
Int. Cl. H01L 21/67 (2006.01); B08B 15/00 (2006.01); C23C 16/44 (2006.01)
CPC C23C 16/4412 (2013.01) [B08B 15/00 (2013.01); H01L 21/67023 (2013.01); B08B 2203/0264 (2013.01); H01L 21/6719 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A substrate treatment apparatus comprising:
a substrate support assembly having a spin head adapted to seat a substrate thereonto;
a fluid supply unit for supplying fluid to the substrate;
a bowl assembly having a plurality of bowls overlaid one another outwardly in a radial direction thereof and surrounding the substrate support assembly;
an ascending and descending unit for moving up and down the bowl assembly; and
a chamber for accommodating the substrate support assembly, the fluid supply unit, the bowl assembly, and the ascending and descending unit,
wherein the chamber is configured to have a plurality of process exhaust parts for performing exhaust from the inside of the bowl assembly and an environment exhaust part for performing exhaust from the outside of the bowl assembly,
wherein the outer peripheral surface of the bowl assembly is surrounded by a ring-shaped first duct for communicating with the environment exhaust part,
wherein the first duct has a plurality of first introducing holes spaced apart from one another on top thereof along the periphery thereof to introduce gases of treatment liquids existing in the chamber thereinto.