US 12,146,125 B2
Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
Marcel Brill, Ludwigshafen (DE); Daniel Loeffler, Ludwigshafen (DE); Yeni Burk, Ludwigshafen (DE); Frank Pirrung, Ludwigshafen (DE); Lothar Engelbrecht, Berlin (DE); Szilard Csihony, Ludwigshafen (DE); Maike Bergeler, Ludwigshafen (DE); Volodymyr Boyko, Ludwigshafen (DE); and Patrick Wilke, Ludwigshafen (DE)
Assigned to BASF SE, Ludwigshafen am Rhein (DE)
Appl. No. 17/057,801
Filed by BASF SE, Ludwigshafen am Rhein (DE)
PCT Filed May 13, 2019, PCT No. PCT/EP2019/062178
§ 371(c)(1), (2) Date Nov. 23, 2020,
PCT Pub. No. WO2019/224032, PCT Pub. Date Nov. 28, 2019.
Claims priority of application No. 18174211 (EP), filed on May 25, 2018.
Prior Publication US 2021/0198602 A1, Jul. 1, 2021
Int. Cl. C11D 7/26 (2006.01); C11D 3/20 (2006.01); C11D 7/50 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); G03F 7/42 (2006.01)
CPC C11D 7/5022 (2013.01) [C11D 3/2006 (2013.01); C11D 3/201 (2013.01); C11D 3/2093 (2013.01); C11D 7/261 (2013.01); C11D 7/266 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01); G03F 7/422 (2013.01); C11D 2111/22 (2024.01)] 8 Claims
 
1. A method of treating a substrate comprising a pattern having line-space dimensions of 50 nm or less and an aspect ratio of 4 or more, the method comprising contacting the substrate with a composition comprising 20 to 30% by weight of 2-propanol and 70 to 80% by weight of ethyl acetate.