US 12,476,078 B2
Plasma generation device and control method therefor
Sae Hoon Uhm, Hwaseong (KR); Yun Seong Lee, Daejeon (KR); Yeong Hoon Sohn, Daejeon (KR); and Se Hong Park, Daejeon (KR)
Assigned to EN2CORE TECHNOLOGY INC., Daejeon (KR)
Appl. No. 17/997,420
Filed by EN2CORE TECHNOLOGY INC., Daejeon (KR)
PCT Filed Jun. 29, 2021, PCT No. PCT/KR2021/008137
§ 371(c)(1), (2) Date Oct. 28, 2022,
PCT Pub. No. WO2022/005150, PCT Pub. Date Jan. 6, 2022.
Claims priority of application No. 10-2020-0080596 (KR), filed on Jun. 30, 2020.
Prior Publication US 2023/0170185 A1, Jun. 1, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/3211 (2013.01) [H01J 37/32183 (2013.01); H01J 37/3244 (2013.01); H01J 2237/334 (2013.01)] 16 Claims
OG exemplary drawing
 
1. An apparatus for generating plasma, comprising:
a chamber configured to provide a generating space for the plasma;
a first power source configured to output an RF voltage;
a second power source configured to output a pulsed DC voltage;
an antenna module placed adjacent to the chamber and surrounding an outer surface of a side wall of the chamber and configured to be connected to the first power source such that an induced electric field is generated in the chamber when the RF voltage is supplied to the antenna module from the first power source;
an electrode placed adjacent to the chamber and configured to be connected to the second power source such that electrons are supplied into the chamber when a voltage difference is supplied between the electrode and a counter electrode from the second power source;
a sensor configured to obtain sensing information related to a status of the plasma; and
a controller configured to control the first power source and the second power source,
wherein, for igniting plasma in the chamber, the controller is further configured to:
control the first power source to output the RF voltage to the antenna module for igniting plasma without supplying the pulsed DC voltage to the electrode from the second power source,
obtain the sensing information related to the status of the plasma while maintaining the RF voltage output,
monitor, during a first time period, whether plasma is ignited based on the sensing information or not, and
control the second power source to output a first pulsed DC voltage to the electrode for supplying electrons into the chamber while maintaining the RF voltage output for assisting the ignition of plasma in response to plasma not being ignited with the induced electric field in the chamber, or control the second power source not to output the pulsed DC voltage to the electrode in response to the plasma being ignited with the induced electric field in the chamber.