US 12,473,647 B2
Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same
Yong Hee Kwone, Daejeon (KR); Young Jae Im, Daejeon (KR); Sang Yong Jeon, Daejeon (KR); Tae Seok Byun, Daejeon (KR); Sang Chan Lee, Daejeon (KR); and Sang Ick Lee, Daejeon (KR)
Assigned to DNF CO., LTD., Daejeon (KR)
Filed by DNF CO., LTD., Daejeon (KR)
Filed on Dec. 27, 2022, as Appl. No. 18/146,894.
Claims priority of application No. 10-2021-0189543 (KR), filed on Dec. 28, 2021; and application No. 10-2022-0166443 (KR), filed on Dec. 2, 2022.
Prior Publication US 2023/0203655 A1, Jun. 29, 2023
Int. Cl. C23C 16/455 (2006.01); C07F 9/90 (2006.01); C23C 16/40 (2006.01)
CPC C23C 16/45553 (2013.01) [C07F 9/90 (2013.01); C23C 16/40 (2013.01); C23C 16/45538 (2013.01)] 14 Claims
 
1. A composition for depositing an antimony-containing thin film comprising:
an antimony compound represented by the following Chemical Formula 1:

OG Complex Work Unit Chemistry
wherein
R1 to R4 are independently of one another linear or branched (C1-C7) alkyl; and
R 5 is branched (C3-C7) alkyl.