US 12,473,640 B2
Supply system for low volatility precursors
Toshiyuki Nakagawa, Kobe (JP); Shingo Okubo, Tsukuba (JP); Kazuma Suzuki, Tsukuba (JP); Ikuo Suzuki, Tsukuba (JP); Koji Ishida, Tsukuba (JP); Takashi Kameoka, Tsukuba (JP); Kazutaka Yanagita, Tsukuba (JP); Mikio Goto, Minato (JP); Koji Matsumoto, Nagano (JP); Fumikazu Nozawa, Sakura (JP); Terumasa Koura, Tsukuba (JP); and Kohei Tarutani, Tsukuba (JP)
Assigned to L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris (FR)
Appl. No. 17/766,497
Filed by L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris (FR)
PCT Filed Oct. 2, 2020, PCT No. PCT/US2020/054021
§ 371(c)(1), (2) Date Apr. 4, 2022,
PCT Pub. No. WO2021/067764, PCT Pub. Date Apr. 8, 2021.
Claims priority of provisional application 62/910,924, filed on Oct. 4, 2019.
Prior Publication US 2024/0052484 A1, Feb. 15, 2024
Int. Cl. C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/4485 (2013.01) [C23C 16/45557 (2013.01); C23C 16/45561 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A system for dispensing a vapor of a precursor to a point of use, the system comprising:
a) a first vessel containing the precursor and configured and adapted to heat the precursor to a temperature that results in a precursor vapor pressure of more than approximately 10 kPa therein;
b) a second vessel being configured and adapted to heat a precursor vapor therein to a temperature ranging from room temperature to a maximum temperature limitation of a flow control device fluidically connected thereto;
c) a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a pressure control device are fluidically connected to the first gas conduit;
d) a second gas conduit fluidically connecting the second vessel to the point of use, wherein the flow control device, configured and adapted to regulate a flow rate of the precursor vapor delivered to the point of use, is fluidically connected to the second vessel and the point of use; and
e) a pressure gauge operably connected to the second vessel and configured and adapted to measure a partial pressure of the precursor vapor in the second vessel,
wherein the system is further configured and adapted to maintain the partial pressure of the precursor in the second vessel (i) at a pressure lower than a saturated vapor pressure of the precursor at a temperature of the second vessel and (ii) at a pressure higher than a minimum inlet pressure requirement of the flow control device,
wherein the second vessel contains at least one dip tube that connects to an outlet port of the second vessel, wherein the outlet port is located in the top of the second vessel or located in the bottom of the second vessel,
wherein the system is further configured to maintain the partial pressure of the precursor in each of the first vessel and the second vessel, the partial pressures are equal to the respective total pressure therein without adding a carrier gas to the precursor vapor in the first vessel and the second vessel.