	US 12,473,457 B2
	Composition for tungsten CMP
Kevin P. Dockery, Aurora, IL (US); Tyler Carter, Naperville, IL (US); Matthew E. Carnes, Chicago, IL (US); Jessica VanKuiken, Glendale Heights, IL (US); and Pankaj Singh, Plainfield, IL (US)
Assigned to CMC MATERIALS LLC, Aurora, IL (US)
Filed by Cabot Microelectronics Corporation, Aurora, IL (US)
Filed on Sep. 14, 2018, as Appl. No. 16/131,180.
Claims priority of provisional application 62/559,259, filed on Sep. 15, 2017.
Prior Publication US 2019/0085209 A1, Mar. 21, 2019
Int. Cl. C09G 1/02 (2006.01); B24B 1/00 (2006.01); B24B 37/04 (2012.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09G 1/06 (2006.01); C09K 13/06 (2006.01); C23F 1/30 (2006.01); C23F 3/06 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01)

CPC C09G 1/02 (2013.01) [B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09G 1/06 (2013.01); C09K 13/06 (2013.01); C23F 1/30 (2013.01); C23F 3/06 (2013.01); H01L 21/30625 (2013.01); H01L 21/3212 (2013.01)]

10 Claims

1. A chemical mechanical polishing composition comprising:

a water based liquid carrier;

abrasive particles dispersed in the liquid carrier, wherein the abrasive particles comprise a colloidal silica abrasive, and the colloidal silica abrasive has a permanent positive charge of at least 10 mV, wherein the permanent positive charge is obtained by incorporating an aminosilane compound in the colloidal silica particles;

an iron containing accelerator, wherein the iron containing accelerator is a soluble iron containing catalyst present in the composition in an amount sufficient to provide a range from about 0.5 to about 20 ppm Fe based on the total weight of the composition;

a hydrogen peroxide oxidizer; and

a cationic polymer having an amino acid monomer unit, wherein the cationic polymer comprises at least one of polylysine, polyarginine, and polyhistidine.