US 12,473,316 B2
Molybdenum (0) precursors for deposition of molybdenum films
Andrea Leoncini, Singapore (SG); Paul Mehlmann, Singapore (SG); Nemanja Dordevic, Singapore (SG); Han Vinh Huynh, Singapore (SG); Doreen Wei Ying Yong, Singapore (SG); Mark Saly, Santa Clara, CA (US); and Bhaskar Jyoti Bhuyan, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed by Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed on Jun. 14, 2024, as Appl. No. 18/743,333.
Application 18/743,333 is a division of application No. 17/146,878, filed on Jan. 12, 2021, granted, now 12,060,370.
Prior Publication US 2024/0343748 A1, Oct. 17, 2024
Int. Cl. C07F 11/00 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01)
CPC C07F 11/00 (2013.01) [C23C 16/0209 (2013.01); C23C 16/0227 (2013.01); C23C 16/0254 (2013.01); C23C 16/45527 (2013.01); C23C 16/56 (2013.01)] 6 Claims
 
1. A method of depositing a film, the method comprising:
exposing a substrate to a metal coordination complex consisting of a molybdenum(0) precursor having a general formula of Mo(L)z, wherein z is 2, and L is selected from the group consisting of

OG Complex Work Unit Chemistry
 wherein each R is independently selected from Me-, Et-, iPr-, and tBu-, and wherein the metal coordination complex is substantially free of halogens and carbonyl groups; and
exposing the substrate to a reactant to react with the molybdenum(0) precursor to form a molybdenum film on the substrate.