US 12,472,708 B2
Treatment of parts by vaporized solvent
Arnau Mestres Rosas, Sant Cugat del Valles (ES); Ariadna Marin Camara, Sant Cugat del Valles (ES); Natalie Harvey, Sant Cugat del Valles (ES); and Xavier Gasso Puchal, Sant Cugat del Valles (ES)
Assigned to PERIDOT PRINT LLC, Palo Alto, CA (US)
Appl. No. 18/287,859
Filed by Peridot Print LLC, Palo Alto, CA (US)
PCT Filed Apr. 29, 2021, PCT No. PCT/US2021/029950
§ 371(c)(1), (2) Date Oct. 20, 2023,
PCT Pub. No. WO2022/231599, PCT Pub. Date Nov. 3, 2022.
Prior Publication US 2024/0181728 A1, Jun. 6, 2024
Int. Cl. C08J 7/02 (2006.01); B29C 64/188 (2017.01); B29C 71/00 (2006.01); B33Y 40/20 (2020.01); F26B 5/04 (2006.01); F26B 9/06 (2006.01); F26B 21/06 (2006.01); F26B 21/10 (2006.01); F26B 21/12 (2006.01); F26B 21/14 (2006.01); B29C 37/00 (2006.01)
CPC B29C 71/0009 (2013.01) [B29C 64/188 (2017.08); B33Y 40/20 (2020.01); F26B 21/145 (2013.01); B29C 2037/90 (2013.01); B29C 2791/006 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method comprising:
placing a part within a chamber;
providing vaporized solvent within the chamber such that the solvent condenses onto the part and treats the part via chemical-mechanical polishing (CMP);
applying a vacuum to the chamber to extract the solvent and stop treatment of the part via the CMP; and
controlling reduction of pressure within the chamber over time to apply the vacuum, according to a predefined time-pressure profile, to at least reduce defects in the part occurring due to the extraction of solvent from the part during application of the vacuum that stops the CMP.