US 12,472,532 B2
Substrate treating apparatus and cleaning nozzle used therein
Geun Sik Yoon, Anseong-si (KR)
Assigned to KCTECH CO., LTD., Anseong-si (KR)
Filed by KCTECH CO., LTD., Anseong-si (KR)
Filed on Feb. 21, 2023, as Appl. No. 18/112,398.
Claims priority of application No. 10-2022-0025365 (KR), filed on Feb. 25, 2022; and application No. 10-2023-0012742 (KR), filed on Jan. 31, 2023.
Prior Publication US 2023/0271228 A1, Aug. 31, 2023
Int. Cl. B08B 3/02 (2006.01); B08B 1/12 (2024.01); B08B 3/10 (2006.01); H01L 21/67 (2006.01)
CPC B08B 3/022 (2013.01) [B08B 1/12 (2024.01); B08B 3/10 (2013.01); H01L 21/67051 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A substrate processing apparatus, comprising:
a support for holding a disk-shaped substrate; and
a cleaning nozzle for spraying a mixed fluid, in which liquid and gas are mixed, to a surface of the substrate in a slit shape through a slit-shaped discharge port to remove foreign substances remaining on the substrate with the mixed fluid discharged from the discharge port,
wherein the cleaning nozzle includes:
a first body having a gas inflow passage where the gas is supplied and passes. and a liquid inflow passage where the liquid is supplied and passes; and
a second body having a gas passage configured to communicate with the gas inflow passage and provided with a slit-shaped through hole formed to pass therethrough in a straight line shape, and liquid passages configured to communicate with the liquid inflow passage and extended inclinedly toward the discharge port to meet the gas passage, wherein a slit-shape hole is formed at a position extending downward from a position where the gas passage and the liquid passages meet, and wherein the second body is coupled to the first body,
wherein between the liquid passages and the liquid inflow passage, a liquid chamber filled with the liquid is formed in an annular shape surrounding the second body.