US D1,051,081 S
Exhaust wall liner for semiconductor manufacturing apparatus
Chang Min Kwon, Hwaseong-si (KR); and Chang Kyo Kim, Hwaseong-si (KR)
Assigned to AP SYSTEMS INC., (KR)
Filed by AP SYSTEMS INC., Hwaseong-Si (KR)
Filed on May 11, 2023, as Appl. No. 29/891,976.
Claims priority of application No. 30-2022-0049282 (KR), filed on Nov. 25, 2022.
Term of patent 15 Years
LOC (14) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
The ornamental design for an exhaust wall liner for a semiconductor manufacturing apparatus, as shown and described.