US 12,142,506 B2
Substrate transfer apparatus, substrate processing system and substrate processing method
Hiromitsu Sakaue, Yamanashi (JP); and Toshiaki Kodama, Yamanashi (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on Dec. 16, 2021, as Appl. No. 17/553,158.
Claims priority of application No. 2020-212876 (JP), filed on Dec. 22, 2020.
Prior Publication US 2022/0199442 A1, Jun. 23, 2022
Int. Cl. H01L 21/677 (2006.01); G01N 21/95 (2006.01)
CPC H01L 21/67742 (2013.01) [G01N 21/9503 (2013.01); H01L 21/67781 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A substrate transfer apparatus for transferring a substrate to a substrate processing apparatus in a reduced pressure atmosphere, the apparatus comprising:
a substrate holder to hold the substrate;
a substrate measurer, provided on the substrate holder, to measure a position of the substrate with respect to the substrate holder and a position of the substrate spaced apart from the substrate holder; and
a controller for controlling the substrate holder and the substrate measurer,
wherein the controller is configured to:
when the substrate holder receives the substrate, in a state in which the substrate holder and the substrate are separated from each other, make the substrate holder in contact with the substrate by moving the substrate holder in a horizontal direction and a vertical direction while a position of the substrate is measured by the substrate measurer;
calculate a distance in the vertical direction between an initial position and a contact position of the substrate holder based on a speed of the substrate holder in the horizontal direction and a speed of the substrate holder in the vertical direction; and
detect a displacement of the substrate holder by comparing the calculated distance in the vertical direction with a previously obtained normal distance in the vertical direction.