US 12,142,493 B2
Substrate processing apparatus and substrate processing method
Young Jun Son, Chungcheongnam-do (KR); Tae Hoon Lee, Chungcheongnam-do (KR); Sung Gyu Lee, Chungcheongnam-do (KR); Hyun Yoon, Chungcheongnam-do (KR); and Do Yeon Kim, Chungcheongnam-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-Do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Nov. 15, 2022, as Appl. No. 17/986,894.
Claims priority of application No. 10-2021-0193592 (KR), filed on Dec. 31, 2021.
Prior Publication US 2023/0215742 A1, Jul. 6, 2023
Int. Cl. H01L 21/67 (2006.01); B01D 35/02 (2006.01)
CPC H01L 21/67051 (2013.01) [B01D 35/02 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a nozzle unit configured to discharge a processing liquid to a substrate;
a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid;
a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and
a control unit connected to the charge amount control unit,
wherein the filter unit includes at least two filters charged with different charges,
wherein the pipe includes a first branch pipe and a second branch pipe branching off in parallel, and the filter unit includes a first filter, disposed at the first branch pipe and charged with positive charges, and a second filter disposed at the second branch pipe and charged with negative charges,
wherein the charge amount control unit includes the control valve disposed at a point, at which the first branch pipe and the second branch pipe are joined, and connected to the control unit to control a flow rate of a processing liquid passing through the first branch pipe and the second branch pipe.