US 12,142,469 B2
Plasma processing chambers configured for tunable substrate and edge sheath control
Rajinder Dhindsa, Pleasanton, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 20, 2022, as Appl. No. 17/970,454.
Claims priority of provisional application 63/270,428, filed on Oct. 21, 2021.
Prior Publication US 2023/0130829 A1, Apr. 27, 2023
Int. Cl. H01J 37/32 (2006.01); H01L 21/683 (2006.01)
CPC H01J 37/3299 (2013.01) [H01J 37/32128 (2013.01); H01J 37/32146 (2013.01); H01J 37/32568 (2013.01); H01J 37/32642 (2013.01); H01J 37/32715 (2013.01); H01L 21/6831 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/3341 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A plasma processing system, comprising:
a signal detection module configured to receive electrical signals from a plurality of first biasing circuits and to receive to receive electrical signals from one or more second pulsed voltage bias circuits, wherein:
each of the first biasing circuits comprises:
one or more first electrodes of a plurality of first electrodes disposed in a dielectric body of a substrate support, wherein the plurality of first electrodes are disposed beneath a substrate supporting surface of the dielectric body;
a first waveform generator of a plurality of first waveform generators each configured to establish a pulsed voltage waveform at the one or more first electrodes; and
a first transmission line of a plurality of first transmission lines, the first transmission line electrically coupling the first waveform generator to the one or more first electrodes, wherein each of the plurality of first waveform generators is configured to establish a pulsed voltage waveform at the one or more first electrodes electrically coupled thereto; and
each of the second pulsed voltage bias circuits comprises:
a second electrode of one or more second electrodes disposed beneath an edge ring supporting surface of the dielectric body;
a second waveform generator of one or more second waveform generators; and
a second transmission line of one or more second transmission lines, wherein each of the one or more second waveform generators is configured to establish a pulsed voltage waveform at the second electrode electrically coupled thereto; and
a non-transitory computer-readable medium having instructions for performing a method comprising:
determining, based on an analysis of the electrical signals received by the signal detection module, one or more characteristics of a plasma or a plasma sheath formed between the substrate support and a chamber lid.