US 12,142,467 B2
Self-assembled monolayer deposition from low vapor pressure organic molecules
Qiwei Liang, Fremont, CA (US); Srinivas D. Nemani, Sunnyvale, CA (US); Keith Tatseun Wong, Mountain View, CA (US); and Antony K. Jan, Mountain View, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 28, 2021, as Appl. No. 17/333,533.
Claims priority of provisional application 63/033,266, filed on Jun. 2, 2020.
Prior Publication US 2021/0375600 A1, Dec. 2, 2021
Int. Cl. H01J 37/32 (2006.01); C23C 16/04 (2006.01); H01L 21/027 (2006.01); H01L 21/32 (2006.01)
CPC H01J 37/32816 (2013.01) [C23C 16/042 (2013.01); H01J 37/32449 (2013.01); H01J 37/32522 (2013.01); H01L 21/0271 (2013.01); H01L 21/32 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A processing chamber, comprising:
a chamber body and a lid plate, the chamber body and the lid plate defining an interior volume of the processing chamber, the lid plate supporting at least one evaporator;
a substrate support disposed in the interior volume of the processing chamber;
a showerhead disposed above the substrate support;
a first heater disposed in the interior volume of the processing chamber in or on the substrate support, the first heater configured to provide temperature control during self-assembled monolayer (SAM) deposition;
a second heater disposed in the interior volume of the processing chamber and proximate the chamber body, the second heater configured to provide temperature control during SAM annealing; and
a controller configured to direct the SAM deposition, to direct the first heater to provide temperature control during the SAM deposition, and to direct the second heater to provide temperature control during the SAM annealing, wherein the second heater is not used to provide temperature control during the SAM deposition.