US 12,142,453 B2
Multi-beam inspection apparatus
Weiming Ren, San Jose, CA (US); Qian Zhang, San Jose, CA (US); Xuerang Hu, San Jose, CA (US); and Xuedong Liu, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jan. 24, 2022, as Appl. No. 17/583,176.
Application 17/583,176 is a continuation of application No. 16/729,190, filed on Dec. 27, 2019, granted, now 11,232,928.
Claims priority of provisional application 62/787,157, filed on Dec. 31, 2018.
Prior Publication US 2022/0216029 A1, Jul. 7, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/147 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/1477 (2013.01) [H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 37/3177 (2013.01); H01J 2237/24592 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A micro-structure deflector array including a plurality of multipole structures, each multipole structure comprising a plurality of pole electrodes, the array comprising:
a first multipole structure of the plurality of multipole structures, the first multipole structure having a first radial shift from a central axis of the array; and
a second multipole structure of the plurality of multipole structures, the second multipole structure having a second radial shift from the central axis of the array,
wherein the first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure.