US 12,142,451 B2
System for inspecting and grounding a mask in a charged particle system
Tianming Chen, San Jose, CA (US); Chiyan Kuan, Danville, CA (US); Yixiang Wang, Fremont, CA (US); and Zhi Po Wang, Beijing (CN)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/778,579
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Oct. 21, 2020, PCT No. PCT/EP2020/079674
§ 371(c)(1), (2) Date May 20, 2022,
PCT Pub. No. WO2021/083773, PCT Pub. Date May 6, 2021.
Claims priority of provisional application 62/926,973, filed on Oct. 28, 2019.
Prior Publication US 2023/0005698 A1, Jan. 5, 2023
Int. Cl. H01J 37/02 (2006.01); G03F 7/00 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/026 (2013.01) [G03F 7/708 (2013.01); H01J 37/28 (2013.01); H01J 2237/0044 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A system for grounding extreme ultraviolet (EUV) masks, comprising:
a grounding component comprising:
a base; and
an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of an EUV mask, the conductive layer exposed by a predefined space within a non-conductive layer of the EUV mask.