US 12,141,517 B2
Use of adaptive replacement maps in digital lithography for local cell replacement
Aravind Inumpudi, Fremont, CA (US); and Thomas L. Laidig, Richmond, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Sep. 20, 2023, as Appl. No. 18/470,717.
Application 18/470,717 is a continuation of application No. 17/457,195, filed on Dec. 1, 2021, granted, now 11,868,700.
Prior Publication US 2024/0012978 A1, Jan. 11, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 30/30 (2020.01); G03F 1/72 (2012.01); G03F 7/00 (2006.01); G06F 30/398 (2020.01); G06F 119/18 (2020.01)
CPC G06F 30/398 (2020.01) [G03F 1/72 (2013.01); G03F 7/70508 (2013.01); G06F 2119/18 (2020.01)] 20 Claims
OG exemplary drawing
 
1. A server for use in performing digital lithography, the server comprising:
a memory comprising a virtual mask file, the virtual mask file including data defining elements that form one or more polygons; and
a controller coupled to the memory, the controller configured to:
receive data defining a table, the table including instructions to edit the elements of the virtual mask file; and
activate, deactivate, shift, or replace the elements according to the table to create an edited virtual mask file;
wherein the server is operable to be used in performing digital lithography on a substrate based on the edited virtual mask file.