US 12,140,875 B2
Metrology measurement method and apparatus
Ilse Van Weperen, Son en Breugel (NL); Han-Kwang Nienhuys, Utrecht (NL); and Teis Johan Coenen, Vught (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/910,118
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Mar. 3, 2021, PCT No. PCT/EP2021/055316
§ 371(c)(1), (2) Date Sep. 8, 2022,
PCT Pub. No. WO2021/180540, PCT Pub. Date Sep. 16, 2021.
Claims priority of application No. 20162286 (EP), filed on Mar. 11, 2020.
Prior Publication US 2023/0100123 A1, Mar. 30, 2023
Int. Cl. G03F 7/00 (2006.01); G01B 11/27 (2006.01); G01B 15/00 (2006.01)
CPC G03F 7/7085 (2013.01) [G01B 11/27 (2013.01); G01B 15/00 (2013.01); G03F 7/70633 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method comprising:
illuminating, a plurality of times, at least part of a structure in or on a substrate with electromagnetic radiation, the at least part of the structure being at a first orientation;
sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure, wherein the plurality of average reflectances are indicative of a parameter of the structure at the plurality of times; and
determining, based on the plurality of average reflectances, an estimation of the parameter of the structure at one or more further times.