| CPC G03F 7/70191 (2013.01) [G02B 26/0833 (2013.01)] | 20 Claims |
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12. A system, comprising:
a slab;
a moveable stage disposable over the slab, the moveable stage configured to support a substrate having a photoresist layer disposed thereon;
a controller configured to provide a mask pattern data to a lithography system, the mask pattern data having an exposure area with a gray pattern, wherein the gray pattern is defined by a plurality of sub-grids, each sub-grid including a plurality of pattern units defined therein; and
a lithography system support coupled to the slab having an opening to allow the moveable stage to pass thereunder, wherein:
the lithography system has a processing unit with an image projection system that receive the mask pattern data;
the image projection system comprising a spatial light modulator with a plurality of spatial light modulator pixels to project a plurality of shots;
the controller is configured to dispose a plurality of patterned lines in each of the plurality of pattern units within each of the sub-grids to vary a local transmittance rate at each sub-grid; and
the controller is configured to instruct each of the spatial light modulators to project the plurality of shots to the plurality of patterned lines in each of the plurality of pattern units in each sub-grid of the gray pattern.
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