| CPC G03F 7/162 (2013.01) [B05C 11/1039 (2013.01)] | 20 Claims |
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1. A substrate treating apparatus comprising:
a treating container comprising an inner cup and an outer cup, the treating container
having an inner space encircled by an outer cup;
a support configured to support and rotate a substrate within the inner space;
an exhaust duct configured to exhaust the inner space, the inner cup having an outer wall
and an inner wall, an outer wall of the inner cup is located between the exhaust duct and the outer cup such that a first surface of the outer wall of the inner cup faces the exhaust duct and a second surface of the outer wall faces away from the exhaust duct, the exhaust duct located within the inner space and between the inner wall and the outer wall of the inner cup; and
at least one guide plate combined with the treating container and configured to guide an airflow within the inner space,
wherein the at least one guide plate is inclined with respect to a tangential direction of the substrate supported by the support such that the airflow within the inner space obliquely flows with respect to the tangential direction of the substrate,
wherein, in a stacking direction of the substrate on the support, a bottom surface of the guide plate is inclined such that the airflow passes below the bottom surface of the guide plate, a direction of the airflow being different at a first edge of the bottom surface of the guide plate than at a second edge of the bottom surface of the guide plate, and
wherein the guide plate is disposed on the second surface of the inner cup that faces away from the exhaust duct.
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