	US 12,140,866 B2
	Photoacid generators, photoresist compositions, and pattern formation methods
Emad Aqad, Northborough, MA (US)
Assigned to Rohm and Haas Electronic Materials LLC, Marlborough, MA (US)
Filed by Rohm and Haas Electronic Materials LLC, Marlborough, MA (US)
Filed on Nov. 10, 2021, as Appl. No. 17/454,331.
Claims priority of provisional application 63/133,189, filed on Dec. 31, 2020.
Prior Publication US 2022/0214614 A1, Jul. 7, 2022
Int. Cl. G03F 7/004 (2006.01); C07C 51/02 (2006.01); C07C 303/32 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); C08F 220/30 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01)

CPC G03F 7/0045 (2013.01) [C07C 51/02 (2013.01); C07C 303/32 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 220/303 (2020.02); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01)]

6 Claims

1. A photoacid generator, comprising a moiety of formula (1):

wherein: Ar¹is a substituted or unsubstituted aryl group; R¹is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar¹and R¹are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator, wherein the photoacid generator is non-ionic.