US 12,140,494 B2
Method to measure light loss of optical films and optical substrates
Jinxin Fu, Fremont, CA (US); Kang Luo, San Jose, CA (US); Fariah Hayee, San Jose, CA (US); and Ludovic Godet, Sunnyvale, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 27, 2023, as Appl. No. 18/397,977.
Application 18/397,977 is a continuation of application No. 17/692,573, filed on Mar. 11, 2022, granted, now 11,892,367.
Claims priority of provisional application 63/159,664, filed on Mar. 11, 2021.
Prior Publication US 2024/0125670 A1, Apr. 18, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G01M 11/02 (2006.01)
CPC G01M 11/0285 (2013.01) [G01M 11/0207 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of optical device metrology comprising:
introducing a first type of light into a first optical device during a first time period, the first optical device comprising an optical substrate and an optical film disposed on the optical substrate, the first optical device including one or more surfaces;
measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the one or more surfaces during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations; and
determining a magnitude between successive peaks and troughs in the measurements along the one or more surfaces to determine a relative amount of optical loss due to scattering or a relative amount of optical loss due to absorption.