US 12,139,784 B2
Vacuum deposition facility and method for coating a substrate
Eric Silberberg, Haltinne (BE); Bruno Schmitz, Nandrin (BE); Sergio Pace, Jodoigne (BE); Remy Bonnemann, Saint-Nicolas (BE); and Didier Marneffe, Engis (BE)
Assigned to ArcelorMittal, Luxembourg (LU)
Appl. No. 16/770,872
Filed by ArcelorMittal, Luxembourg (LU)
PCT Filed Dec. 11, 2018, PCT No. PCT/IB2018/059858
§ 371(c)(1), (2) Date Jun. 8, 2020,
PCT Pub. No. WO2019/116215, PCT Pub. Date Jun. 20, 2019.
Prior Publication US 2020/0362450 A1, Nov. 19, 2020
Int. Cl. C23C 14/24 (2006.01); C23C 14/56 (2006.01)
CPC C23C 14/24 (2013.01) [C23C 14/562 (2013.01); C23C 14/564 (2013.01)] 31 Claims
OG exemplary drawing
 
1. A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility comprising:
a vacuum chamber including:
a central casing having a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the vapor jet coater configured to spray metal or metal alloy vapors onto the substrate, inner walls of the central casing configured to be heated at a temperature above a condensation temperature of the metal or metal alloy vapors; and
a vapor trap in a form of an external casing located at the substrate exit of the central casing, vapor trap inner walls configured to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors,
a substrate path in the vacuum chamber through the central casing and the vapor trap,
a passage linking the central casing to the vapor trap including at least one thermal connector comprising an inward end and an outward end, the at least one thermal connector inserted into the substrate exit of the central casing such that outer walls of the central casing and outer walls of the vapor trap directly contact, the thermal connector extending from the outer walls of the vapor trap to the inner walls of the central casing.