| CPC C02F 9/00 (2013.01) [C02F 1/008 (2013.01); C02F 1/325 (2013.01); C02F 1/001 (2013.01); C02F 1/283 (2013.01); C02F 1/32 (2013.01); C02F 1/42 (2013.01); C02F 1/44 (2013.01); C02F 1/441 (2013.01); C02F 1/444 (2013.01); C02F 1/50 (2013.01); C02F 1/725 (2013.01); C02F 1/78 (2013.01); C02F 2103/04 (2013.01); C02F 2103/346 (2013.01); C02F 2209/003 (2013.01); C02F 2209/006 (2013.01); C02F 2209/20 (2013.01); C02F 2209/23 (2013.01); C02F 2209/235 (2013.01); C02F 2301/046 (2013.01); C02F 2303/04 (2013.01); C02F 2303/14 (2013.01); C02F 2303/20 (2013.01); C02F 2305/10 (2013.01)] | 6 Claims |
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1. A wash water processing apparatus for semiconductor manufacture, liquid-crystal manufacture, and electronic components, the apparatus having:
a washing processing part for cleaning at semiconductor manufacture or liquid-crystal manufacture and cleaning electronic components;
a wash water storage part connected to the washing processing part via a circulation flow path in order to allow pure water after cleaning flow as processed water and store thereof;
a sterilization and purification unit which has an ozone supply part connected to the wash water storage part via a flow-in flow path and a flow-out flow path so that processed water is circulatable;
a filtration mechanism part which is configured to include a filtration device of a filter connected to a subsequent part following the wash water storage part via a filtration flow path and an ion exchange resin;
the circulation flow path connecting the subsequent part following the filtration mechanism part and the washing processing part; and
TOC concentration measurement means and TOC concentration adjustment means provided midway in the circulation flow path,
wherein: the washing processing part, the wash water storage part, and the filtration mechanism part are connected so as to configure the entire wash water processing apparatus without ends, in circulatable state;
the TOC concentration adjustment means is adjustment means for performing discharge of processed water and supply of pure water to prevent elution of TOC from each portion configuring the wash water storage part and the filtration mechanism part;
the apparatus further comprises a control apparatus having a memory part storing an arithmetic expression capable of calculating a discharge amount of processed water and a supply amount of pure water in accordance with an ozone-water concentration and a TOC concentration of processed water;
bacteria in the processed water in the wash water storage part are sterilized and decomposed by circulation between the wash water storage part and the sterilization and purification unit;
the ozone-water concentration is controlled to a low concentration by mixture of processed water flowing in from the washing processing part and stored in the wash water storage part and sterilized and dissolved processed water and by autolysis of ozone;
the control apparatus controls the ozone supply part by passing low-concentration ozone water having an ozone-water concentration equal to or less than 5.37 mg/L from the wash water storage part through both the filter and the ion exchange resin in order to suppress oxidative deterioration of the filter and the ion exchange resin to reduce a decrease in filtration performance of the filtration mechanism part;
the low-concentration ozone water reduces an occurrence of slime occurring to the filter and the ion exchange resin themselves;
and, in accordance with a TOC concentration eluted from each portion configuring the wash water storage part and the filtration mechanism part, by discharge of processed water and supply of pure water at the TOC concentration adjustment means, before the washing processing part, the TOC concentration of wash water for use is controlled at a control value equal to or less than a predetermined value in pure water to control so that the processed water is usable for cleaning at the washing processing part.
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