	US 12,139,414 B2
	Method for producing halide
Takashi Kubo, Hyogo (JP); Yusuke Nishio, Osaka (JP); Koki Ueno, Osaka (JP); Akihiro Sakai, Nara (JP); and Akinobu Miyazaki, Osaka (JP)
Assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., Osaka (JP)
Filed by Panasonic Intellectual Property Management Co., Ltd., Osaka (JP)
Filed on May 18, 2021, as Appl. No. 17/323,925.
Application 17/323,925 is a continuation of application No. PCT/JP2019/025436, filed on Jun. 26, 2019.
Claims priority of application No. 2018-243603 (JP), filed on Dec. 26, 2018.
Prior Publication US 2021/0269320 A1, Sep. 2, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C01D 15/04 (2006.01)

CPC C01D 15/04 (2013.01) [C01P 2006/40 (2013.01)]

13 Claims

1. A production method, comprising:

producing a halide by heat-treating, in an inert gas atmosphere, a mixed material in which LiX, YZ₃, and at least one of LiX′ or YZ′₃are mixed, wherein:

X is an element selected from the group consisting of Cl, Br, and I,

Z is an element selected from the group consisting of Cl, Br, and I, and different from X,

X′ is an element selected from the group consisting of Cl, Br, and I, and different from either X or Z; and Z′ is an element selected from the group consisting of Cl, Br, and I and different from either X or Z, and

the mixed material is heat-treated at higher than or equal to 200° C. and lower than or equal to 650° C.