US 12,138,847 B2
Imprint apparatus, imprint method, method of manufacturing article, determination method, and non-transitory computer-readable storage medium
Toshihiko Nishida, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Mar. 31, 2022, as Appl. No. 17/709,885.
Claims priority of application No. 2021-066065 (JP), filed on Apr. 8, 2021.
Prior Publication US 2022/0324158 A1, Oct. 13, 2022
Int. Cl. G03F 7/00 (2006.01); B29C 31/04 (2006.01); B29C 59/00 (2006.01); B29C 59/02 (2006.01); B29L 31/34 (2006.01)
CPC B29C 59/026 (2013.01) [B29C 31/048 (2013.01); B29C 59/002 (2013.01); B29L 2031/34 (2013.01); G03F 7/0002 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising:
a supplier configured to supply the imprint material as a plurality of droplets onto the substrate; and
a controller configured to control the supplier based on information indicating a target arrangement of the imprint material to be supplied as the plurality of droplets onto a predetermined region of the substrate,
wherein the plurality of droplets in the target arrangement include
a first droplet group including a plurality of first droplet arrays, each of the plurality of first droplet arrays consisting of droplets arrayed at a first pitch in a first direction along a side of the predetermined region, the plurality of first droplet arrays being arranged at a second pitch in a second direction different from the first direction,
a second droplet group including a plurality of second droplet arrays, each of the plurality of second droplet arrays consisting of droplets arrayed at the first pitch in the first direction, the plurality of second droplet arrays being arranged at the second pitch in the second direction, and
a single third droplet array consisting of a plurality of droplets arrayed at the first pitch in the first direction,
wherein the second droplet group is arranged while being shifted, with respect to the first droplet group, by a first distance in the first direction and by a second distance in the second direction, the first distance being smaller than the first pitch, and the second distance being half the second pitch, and
wherein the third droplet array is arranged while being shifted, with respect to a specific droplet array which is the first droplet array of the first droplet group closest to the side of the predetermined region, by the first distance in the first direction, and a distance between the specific droplet array and the third droplet array in the second direction is smaller than the second distance.