US 12,138,741 B2
Polishing fluid collection apparatus and methods related thereto
Lizhong Sun, San Jose, CA (US); Peng Liu, Xi'an (CN); and Jianjun Hu, Xi'an (CN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 17/430,688
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Apr. 4, 2019, PCT No. PCT/CN2019/081499
§ 371(c)(1), (2) Date Aug. 12, 2021,
PCT Pub. No. WO2020/199193, PCT Pub. Date Oct. 8, 2020.
Prior Publication US 2022/0193863 A1, Jun. 23, 2022
Int. Cl. B24B 55/12 (2006.01); B24B 37/00 (2012.01); B24B 57/02 (2006.01)
CPC B24B 55/12 (2013.01) [B24B 37/00 (2013.01); B24B 57/02 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A polishing fluid catch basin assembly for a chemical mechanical polishing system, the polishing fluid catch basin assembly comprising:
a catch basin having an annular ring shape and sized to surround a polishing platen of the chemical mechanical polishing system and to be spaced apart therefrom the polishing platen, the catch basin comprising:
an outer wall having a plurality of openings disposed therethrough, wherein
individual ones of the plurality of openings are sized to receive a respective nozzle of a plurality of nozzles, and
the openings are disposed through a portion of the outer wall which will be beneath a plane of an upper surface of the polishing platen or a polishing pad mounted on the polishing platen when the catch basin is mounted in the chemical mechanical polishing system;
an inner wall disposed radially inward of the outer wall; and
a base portion connecting the inner wall to the outer wall, wherein
the outer wall, the inner wall, and the base portion collectively define a trough, and
a radially inward facing surface of the inner wall is defined by a radius greater than a radius of the polishing platen the catch basin is sized to surround.