US 12,138,654 B2
Vapor phase deposition of organic films
Viljami J. Pore, Helsinki (FI); Marko Tuominen, Helsinki (FI); and Hannu Huotari, Helsinki (FI)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP HOLDING B.V., Almere (NL)
Filed on Jun. 23, 2022, as Appl. No. 17/808,384.
Application 17/808,384 is a continuation of application No. 17/022,622, filed on Sep. 16, 2020, granted, now 11,389,824.
Application 17/022,622 is a continuation of application No. 16/429,750, filed on Jun. 3, 2019, granted, now 10,814,349, issued on Oct. 27, 2020.
Application 16/429,750 is a continuation of application No. 15/070,594, filed on Mar. 15, 2016, granted, now 10,343,186, issued on Jul. 9, 2019.
Application 15/070,594 is a continuation in part of application No. 14/879,962, filed on Oct. 9, 2015, granted, now 10,695,794, issued on Jun. 30, 2020.
Prior Publication US 2022/0323991 A1, Oct. 13, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); B05D 1/00 (2006.01); B05D 1/36 (2006.01); C23C 16/30 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B05D 3/14 (2006.01)
CPC B05D 1/60 (2013.01) [B05D 1/36 (2013.01); C23C 16/30 (2013.01); C23C 16/45523 (2013.01); C23C 16/45525 (2013.01); H01L 21/02118 (2013.01); H01L 21/02271 (2013.01); H01L 21/0228 (2013.01); H01L 21/0234 (2013.01); H01L 21/67 (2013.01); B05D 3/145 (2013.01); B05D 2505/50 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An apparatus for organic film deposition, the apparatus comprising:
a vessel configured to vaporize an organic reactant to form a reactant vapor;
a reaction space configured to accommodate a substrate;
a gas distribution block overlying the substrate, the gas distribution block comprising an outlet to an exhaust and a valve for controlling exhaust from the gas distribution block for purging, and the gas distribution block configured to distribute the reactant vapor in the reaction space from over the substrate;
a gas line fluidly connecting the vessel and the reaction space, the gas line extending through a side of a reactor defining the reaction space to the gas distribution block; and
a control system configured to cause the apparatus to:
transport the reactant vapor from the vessel to the substrate by way of the gas line such that the reactant vapor enters the gas distribution block through the side of the reactor and is distributed from the gas distribution block;
maintain the vessel at or above a temperature A;
maintain the substrate at a temperature B, which is below about 120° C., the temperature B being between 5° C. and 50° C. lower than the temperature A; and
deposit an organic film on the substrate.