| CPC H10H 29/142 (2025.01) [H10H 20/835 (2025.01); H10H 20/856 (2025.01); H10K 59/123 (2023.02); H10K 59/80518 (2023.02); H10H 20/0364 (2025.01); H10H 20/857 (2025.01)] | 20 Claims |
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1. A method of forming a display device, the method comprising:
forming an isolation structure over a reflector electrode;
forming a hard mask layer over the isolation structure;
forming a first opening extending through the hard mask layer and the isolation structure to expose a first surface of the reflector electrode, wherein inner sidewalls of the hard mask layer and the isolation structure define sidewalls of the first opening;
performing a cleaning process to clean the first surface of the reflector electrode;
forming a conductive layer over the hard mask layer, the sidewalls of the first opening, and the first surface of the reflector electrode;
performing a first removal process to remove peripheral portions of the conductive layer to form a via structure that extends through the isolation structure and directly contacts the first surface of the reflector electrode; and
performing a second removal process after the first removal process to remove peripheral portions of the hard mask layer to expose the isolation structure, wherein the hard mask layer separates the via structure from a top surface of the isolation structure after the second removal process.
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