| CPC H10F 77/1433 (2025.01) [H10F 30/288 (2025.01); H10F 71/00 (2025.01)] | 6 Claims |

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1. A method for manufacturing a photoelectric device based on quantum dots, comprising:
preparing zinc oxide solution and zirconium oxide solution;
coating the zinc oxide solution on a substrate to form a zinc oxide layer;
coating quantum dots on the zinc oxide layer to form a quantum dots (QDs) layer;
forming a zirconium oxide layer on the QDs layer; and
forming an electrode on the substrate,
wherein the photoelectric device is used as a color selective image sensor,
wherein the zirconium oxide layer is formed through one coating process and two heat treatment processes,
wherein the one coating process is performed at a speed of 3000 rpm for 30 seconds, and the two heat treatment processes include primary heat treatment at 120° C. for 1 minute followed by secondary heat treatment at 300° C. for 1 minute.
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