| CPC H10B 43/27 (2023.02) [H01L 21/28537 (2013.01); H10B 41/27 (2023.02); H10B 41/41 (2023.02); H10B 43/40 (2023.02); H10D 64/64 (2025.01)] | 20 Claims |

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1. A microelectronic device, comprising:
a stack structure comprising conductive material and insulative material vertically alternating with the conductive material;
a cell pillar structure vertically extending through the stack structure and comprising:
fill material;
channel material surrounding outer sidewalls and an upper surface of the fill material; and
an outer material stack surrounding outer sidewalls of the channel material; and
a high work function (HWF) metal material vertically overlying the stack structure, the HWF metal material having a work function greater than or equal to about 4.7 electronvolts (eV) and comprising:
a first portion substantially continuously horizontally extending over the stack structure and the cell pillar structure, the first portion in physical contact with an upper surface of the channel material of the cell pillar structure; and
a second portion vertically projecting from the first portion and in physical contact with upper portions of the outer sidewalls of the channel material of the cell pillar structure and upper surfaces of the outer material stack.
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