US 12,471,202 B2
Matchless plasma source for semiconductor wafer fabrication
Maolin Long, Santa Clara, CA (US); Yuhou Wang, Fremont, CA (US); Ricky Marsh, San Ramon, CA (US); and Alex Paterson, San Jose, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Mar. 6, 2025, as Appl. No. 19/072,918.
Application 19/072,918 is a continuation of application No. 18/974,593, filed on Dec. 9, 2024.
Application 18/974,593 is a continuation of application No. 18/340,437, filed on Jun. 23, 2023, granted, now 12,193,138, issued on Jan. 7, 2025.
Application 18/340,437 is a continuation of application No. 17/558,332, filed on Dec. 21, 2021, granted, now 11,716,805, issued on Aug. 1, 2023.
Application 17/558,332 is a continuation of application No. 16/853,516, filed on Apr. 20, 2020, granted, now 11,224,116, issued on Jan. 11, 2022.
Application 16/853,516 is a continuation of application No. 16/356,180, filed on Mar. 18, 2019, granted, now 10,638,593, issued on Apr. 28, 2020.
Application 16/356,180 is a continuation of application No. 15/787,660, filed on Oct. 18, 2017, granted, now 10,264,663, issued on Apr. 16, 2019.
Prior Publication US 2025/0203748 A1, Jun. 19, 2025
Int. Cl. H01J 37/32 (2006.01); H03F 3/217 (2006.01); H05H 1/46 (2006.01)
CPC H05H 1/46 (2013.01) [H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H03F 3/2173 (2013.01); H05H 1/4652 (2021.05); H05H 1/466 (2021.05); H05H 2242/10 (2013.01); H05H 2242/24 (2021.05)] 13 Claims
OG exemplary drawing
 
1. An inductively coupled plasma (ICP) radio frequency (RF) power delivery system comprising:
a plurality of direct current (DC) voltage sources, each of the plurality of DC voltage sources connected to one of a plurality of RF resonance and amplification circuits, each of the plurality of RF resonance and amplification circuits configured to operate according to one of a plurality of different frequency ranges that are coupled to plasma, each of the plurality of RF resonance and amplification circuits including:
a switch network including a switch; and
a resonance circuit configured to operate according to the one of the plurality of different frequency ranges, including:
a reactive circuit including a capacitor; and
an ICP coil connected to the reactive circuit; and
a controller configured to control power provided to each of the ICP coils by:
changing a voltage supplied from a respective one of the plurality of DC voltage sources; and
changing an operating frequency provided to each of the ICP coils, wherein a voltage applied through a respective one of the switches that is open is changed to increase and decrease and then the respective one of the switches is closed for a time period of a cycle.