| CPC H01L 23/642 (2013.01) [H01L 23/58 (2013.01); H10N 15/10 (2023.02)] | 20 Claims |

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1. A semiconductor structure located over a substrate, wherein the semiconductor structure comprises a parallel connection of a first component and a second component, wherein:
the first component comprises a series connection of a diode and a capacitor that is selected from a metal-ferroelectric-metal capacitor and a metal-antiferroelectric-metal capacitor;
the second component comprises a battery structure that includes a first battery electrode layer and a second battery electrode layer that comprises a layer of a metallic material including at least one transition metal or a conductive metal oxide material; and
the second battery electrode layer is in direct contact with a semiconductor layer of the diode.
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10. A semiconductor structure comprising a layer stack that includes, from one side to another:
a first battery electrode layer;
an energy storage medium layer;
a second battery electrode layer;
a diode layer stack including a p-n junction or a p-i-n junction therein;
a first capacitor electrode layer;
a node dielectric layer that comprises a ferroelectric material layer or an antiferroelectric material layer; and
a second capacitor electrode layer.
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16. A semiconductor structure comprising a parallel connection of a first component and a second component, wherein:
the first component comprises a series connection of a diode and a capacitor;
the second component comprises a battery structure that includes a first battery electrode layer and a second battery electrode layer that comprises a layer of a metallic material including at least one transition metal or a conductive metal oxide material; and
the second battery electrode layer is in direct contact with a semiconductor layer of the diode.
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