US 12,469,751 B2
Apparatus to detect and quantify radical concentration in semiconductor processing systems
Mehran Moalem, Fremont, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 3, 2022, as Appl. No. 17/735,837.
Claims priority of provisional application 63/242,402, filed on Sep. 9, 2021.
Claims priority of provisional application 63/196,576, filed on Jun. 3, 2021.
Prior Publication US 2022/0392812 A1, Dec. 8, 2022
Int. Cl. H01L 21/66 (2006.01); H01J 37/32 (2006.01)
CPC H01L 22/20 (2013.01) [H01J 37/32816 (2013.01); H01J 37/32899 (2013.01); H01J 37/32981 (2013.01); H01J 2237/244 (2013.01); H01J 2237/24585 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A processing tool, comprising:
a processing chamber; and
a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber, wherein the NRMS analyzer comprises:
a first chamber fluidically coupled to the processing chamber, wherein the first chamber comprises a modulator, the modulator configured to chop a molecular beam from the processing chamber to generate a square wave signal; and
a second chamber fluidically coupled to the first chamber, wherein the second chamber is a residual gas analyzer or a mass spectrometer, and wherein an unobstructed line of sight passes from the processing chamber to the second chamber.