US 12,469,719 B2
Substrate processing apparatus and method
Jae Yoon Shin, Chungcheongnam-do (KR); and Kee Woong Kim, Chungcheongnam-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Jul. 14, 2022, as Appl. No. 17/864,613.
Claims priority of application No. 10-2021-0111466 (KR), filed on Aug. 24, 2021.
Prior Publication US 2023/0063546 A1, Mar. 2, 2023
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/67023 (2013.01) [H01L 21/67173 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An apparatus for processing a substrate comprising:
a first processing bath and a second processing bath disposed adjacent to each other in a first direction;
a first partition wall disposed between the first processing bath and the second processing bath and having an entrance, through which a substrate passes;
a transfer unit installed in the first processing bath and the second processing bath and for moving the substrate;
a chemical solution supply unit installed in the first processing bath and for providing a chemical solution to the substrate; and
a first exhaust unit disposed between the first processing bath and the second processing bath, connected to the first partition wall, comprising a plurality of exhaust holes disposed along a second direction different from the first direction, and for exhausting mist in the first processing bath,
wherein the first exhaust unit includes a first side wall protruding more than the first partition wall toward the first processing bath, and a first connection wall connecting the first side wall and the first partition wall,
wherein the plurality of exhaust holes are installed in the first side wall.