US 12,469,693 B2
Method of forming a carbon-containing layer and structure including the layer
Yoshiyuki Kikuchi, Tokyo (JP)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Sep. 15, 2020, as Appl. No. 17/021,760.
Claims priority of provisional application 62/901,486, filed on Sep. 17, 2019.
Prior Publication US 2021/0082692 A1, Mar. 18, 2021
Int. Cl. H01L 21/02 (2006.01); B05D 1/00 (2006.01); B05D 3/10 (2006.01); C23C 16/26 (2006.01); C23C 16/50 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01)
CPC H01L 21/02115 (2013.01) [B05D 1/60 (2013.01); B05D 3/107 (2013.01); C23C 16/26 (2013.01); H01L 21/0271 (2013.01); H01L 21/31111 (2013.01)] 23 Claims
OG exemplary drawing
 
1. A method of forming a structure comprising a hard mask formed of a carbon-containing layer on a surface of a substrate, the method comprising the steps of:
providing a substrate on a susceptor within a reaction chamber of a reactor;
heating a carbon precursor to produce a vaporized gas comprising carbon-containing molecules;
providing the vaporized gas to the reaction chamber though a gas distribution device coupled to a plasma power source; and
polymerizing the carbon-containing molecules by applying a plasma power from the plasma power source to the gas distribution device to form the carbon-containing layer on the surface of a substrate,
wherein the susceptor forms an electrode that is coupled to ground,
wherein the carbon precursor comprises a carbon compound comprising one or more sp3 hybridization carbon bonds,
wherein the carbon compound is a solid at normal temperature and pressure,
wherein the carbon compound is dissolved in a solvent, and
wherein the carbon compound comprises 10 or more carbon atoms.