US 12,469,678 B2
Plasma process system for multi-station
Sae Hoon Uhm, Hwaseong-si (KR); Dong Jegal, Yongin-si (KR); Yeonghoon Sohn, Daejeon (KR); Gyueng Hyuen Choe, Chungcheongbuk-do (KR); Se Hong Park, Daejeon (KR); and Jin Huh, Daejeon (KR)
Assigned to EN2CORE TECHNOLOGY, INC., Daejeon (KR)
Appl. No. 18/548,754
Filed by EN2CORE TECHNOLOGY, INC., Daejeon (KR)
PCT Filed Dec. 28, 2022, PCT No. PCT/KR2022/021551
§ 371(c)(1), (2) Date Sep. 1, 2023,
PCT Pub. No. WO2023/128627, PCT Pub. Date Jul. 6, 2023.
Claims priority of application No. 10-2021-0193985 (KR), filed on Dec. 31, 2021.
Prior Publication US 2024/0162006 A1, May 16, 2024
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32165 (2013.01) [H01J 37/3211 (2013.01); H01J 37/32467 (2013.01); H01J 37/32743 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/327 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system for plasma processing for multi station, the system comprising:
a processing chamber including a first station and a second station;
a first plasma generator coupled to the first station;
a first inverter configured to provide AC power to the first plasma generator;
a first sensing unit configured to sense electric characteristics related to the first plasma generator;
a second plasma generator coupled to the second station;
a second inverter configured to provide AC power to the second plasma generator;
a second sensing unit configured to sense electric characteristics related to the second plasma generator; and
a controller configured to control the first inverter and the second inverter,
wherein the first plasma generator includes a first discharge tube fluidically coupled to the first station and a first antenna structure placed to surround the first discharge tube,
wherein the second plasma generator includes a second discharge tube fluidically coupled to the second station and a second antenna structure placed to surround the second discharge tube,
wherein the first antenna structure is configured to receive AC power from the first inverter and induce plasma inside the first discharge tube, and
wherein the second antenna structure is configured to receive AC power from the second inverter and induce plasma inside the second discharge tube.