US 12,468,235 B2
Method and apparatus to determine a patterning process parameter
Anagnostis Tsiatmas, Eindhoven (NL); Paul Christiaan Hinnen, Veldhoven (NL); Elliott Gerard Mc Namara, Eindhoven (NL); Thomas Theeuwes, Veldhoven (NL); Maria Isabel De La Fuente Valentin, Eindhoven (NL); Mir Homayoun Shahrjerdy, Eindhoven (NL); Arie Jeffrey Den Boef, Waalre (NL); and Shu-Jin Wang, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Mar. 29, 2024, as Appl. No. 18/621,218.
Application 18/621,218 is a continuation of application No. 17/497,087, filed on Oct. 8, 2021, granted, now 11,947,269.
Application 17/497,087 is a continuation of application No. 16/178,638, filed on Nov. 2, 2018, granted, now 11,143,972.
Claims priority of application No. 17203287 (EP), filed on Nov. 23, 2017.
Prior Publication US 2024/0361702 A1, Oct. 31, 2024
Int. Cl. G03F 7/00 (2006.01); G06T 7/00 (2017.01); G03F 7/20 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 7/70625 (2013.01); G03F 7/70683 (2013.01); G06T 7/0006 (2013.01); G03F 7/20 (2013.01); G03F 7/706831 (2023.05); G03F 7/706847 (2023.05); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than a respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and
by a hardware computer system, determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe including parameters of a non-linear representation for determining the patterning process parameter.