US 12,468,231 B2
Exposure apparatus, exposure method and article manufacturing method
Masaki Imai, Saitama (JP); and Mamoru Kaneishi, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jul. 27, 2023, as Appl. No. 18/360,238.
Claims priority of application No. 2022-128386 (JP), filed on Aug. 10, 2022.
Prior Publication US 2024/0053686 A1, Feb. 15, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70358 (2013.01) [G03F 7/70725 (2013.01); G03F 7/70775 (2013.01)] 15 Claims
OG exemplary drawing
 
1. An exposure apparatus for scanning and exposing a plurality of shot regions on a substrate, comprising:
a stage configured to hold and drive the substrate; and
a control unit configured to control driving of the stage based on a first acceleration profile used for an acceleration of the stage in a non-exposure section and a second acceleration profile used for the acceleration of the stage in an exposure section in which a shot region among the plurality of shot regions is exposed,
wherein the second acceleration profile includes a part of a sine wave, and
the control unit controls the driving of the stage for each of the plurality of shot regions by using the second acceleration profile in which at least one of an angular velocity of the sine wave and a phase of the sine wave at which the first acceleration profile and the second acceleration profile are connected, is determined based on information about a size of the shot region.