US 12,468,230 B2
Optical component and optical system, in particular for microlithography
Jeffrey Erxmeyer, Oberkochen (DE); Martin Hermann, Heidenheim (DE); Nils Lundt, Ulm (DE); and Conrad Wolke, Aalen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on May 22, 2023, as Appl. No. 18/321,244.
Claims priority of application No. 102022113164.5 (DE), filed on May 24, 2022.
Prior Publication US 2023/0384687 A1, Nov. 30, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70316 (2013.01) 20 Claims
OG exemplary drawing
 
1. An optical component having optical surfaces, the optical component comprising:
a first layer system configured to exhibit a first wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon; and
a second layer system configured to exhibit a second wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon, wherein:
the first layer system and the second layer system are on different optical surfaces of the optical element;
for each wavelength over an entire wavelength range of from 100 nm to 700 nm, a total wavelength-dependent reflectivity curve is a sum of the first and second wavelength-dependent reflectivity curves; and
over an entire wavelength range of from 160 nm to 240 nm, the total wavelength-dependent reflectivity curve deviates from a constant value by no more than 5%.