US 12,468,226 B2
Photoresist compositions and methods of fabricating a semiconductor device
Honggu Im, Hwaseong-si (KR); Sumin Kim, Suwon-si (KR); Yechan Kim, Hwaseong-si (KR); Jinjoo Kim, Seoul (KR); Hyunwoo Kim, Seongnam-si (KR); Sunghwan Park, Suwon-si (KR); Juhyeon Park, Hwaseong-si (KR); Jicheol Park, Anyang-si (KR); Giyoung Song, Anyang-si (KR); and Sukkoo Hong, Suwon-si (KR)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Nov. 17, 2022, as Appl. No. 18/056,332.
Claims priority of application No. 10-2021-0159817 (KR), filed on Nov. 18, 2021.
Prior Publication US 2023/0152694 A1, May 18, 2023
Int. Cl. G03F 7/039 (2006.01); G03F 7/038 (2006.01)
CPC G03F 7/0392 (2013.01) [G03F 7/0384 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A photoresist composition comprising:
a photosensitive polymer;
a photoacid generator (PAG); and
a solvent,
wherein the photosensitive polymer comprises a first repeating unit having a structure of Chemical Formula 1:

OG Complex Work Unit Chemistry
wherein R1 is hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 15 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or a cycloalkenyl group having 3 to 12 carbon atoms,
R2 is an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 15 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or a carboxylate group having 1 to 6 carbon atoms, and
R3 is hydrogen, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an aryl group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkenyl group having 3 to 7 carbon atoms.
 
11. A photoresist composition comprising:
a photosensitive polymer;
a photoacid generator (PAG);
a basic quencher; and
a solvent,
wherein the photosensitive polymer is a random copolymer comprising a first repeating unit having a structure of Chemical Formula 1, a second repeating unit having a structure of Chemical Formula 2, and a third repeating unit having a structure of Chemical Formula 3:

OG Complex Work Unit Chemistry
wherein R1 is hydrogen, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 15 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or a cycloalkenyl group having 3 to 12 carbon atoms,
R2 is an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 15 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or a carboxylate group having 1 to 6 carbon atoms,
R3 is hydrogen, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an aryl group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkenyl group having 3 to 7 carbon atoms,
R4a is hydrogen, a hydroxyl group, a carboxyl group, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, R4b is a hydroxyl group or a carboxyl group, and
R2a is a hydrogen atom, a linear or branched alkyl group having 1 to 6 carbon atoms, a halogen atom, or a linear or branched alkyl halide group having 1 to 6 carbon atoms, and R2b is an acid-labile protecting group.